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> Products > Wafer Processing Systems > Plating Systems

Plating Systems

High-performance electroplating solutions designed to deliver precise, uniform deposition for advanced semiconductor and panel-level packaging applications.

Advanced Plating Systems

EBARA Technologies’ plating systems provide high-speed, high-uniformity electroplating for a wide range of semiconductor and advanced packaging processes. Leveraging proven paddle technology and extensive process expertise, these systems support flexible configurations for multiple applications while ensuring consistent performance, scalability, and yield improvement.

Model UFP600AS

Model UFP600AS

The UFP600AS is a cleanroom-compatible electroplating system that utilizes EBARA’s high-speed paddle technology to deliver superior uniformity and high-speed deposition for advanced panel-level packaging processes including bump, pillar, rewiring, and through via applications.

Features

High throughput capability
Superior uniformity performance
Suitable for plating on diverse substrates and thin seed layers
Suitable for a variety of applications
Flexible platform configuration

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